Experimental characterization of emittance growth induced by the nonuniform transverse laser distribution in a photoinjector

The emittance of a high-brightness electron beam from a photoinjector is affected by the transverse and longitudinal distributions of the laser beam illuminating the cathode. A nonuniform laser beam generates a nonuniform electron-beam distribution that experiences emittance growth on a time scale of the plasma period. Experiments were performed at the Brookhaven Accelerator Test Facility to investigate the emittance growth due to transversely nonuniform laser beams. Laser masks were fabricated to generate various laser distributions. Significant emittance growth was observed as the laser distribution deviated strongly from a uniform distribution. For cylindrically symmetric, nonuniform distributions, experimental results agree with parmela simulations. The emittance dependence on the bunch charge is linear as a function of the bunch charge for both uniform and nonuniform beams. For a uniform beam, the emittance measurements agree well with the predictions from parmela simulations, but the analytical approach overestimates the results. For nonuniform beams, analytical estimates are about 70% of the measurements. For noncylindrically symmetric, nonuniform beams, we observed that the emittance is linearly proportional to the rms laser nonuniformity and the best emittance for a perfectly uniform beam is extrapolated to be 1.07±0.13   mm mrad at 0.5 nC.